Part's
당신을 위한 제품을 제작해 드립니다.
Cluster System
Wafer & Carrier: 8″ Std.
Application: 4 sided and 1 L/L
Vacuum Capacity: Base Vacuum : <1Torr
Robot Repeatability:
R Axis : 755mm± 0.05mm(3σ)
T(Ɵ) Axis : Infinite Rot. ± 0.003o(3σ)
Z Axis : 25mm or 35mm ± 0.05mm(3σ)
Pumping : Two step (Soft & Fast) Pumping
LED PSS Etching Chamber
LED PSS Etching Chamber Modify
Chemical Anneal In-line Heater
Metal Analysis Manual Heater
Wafer Table Anneal Heater
Process Temp & Control: R.T. ~ 250 ℃
Heating Elements: Tungsten Halogen Lamp
Chemical Inline Heater
Process Temp & Control: R.T. ~ 180 ℃
Chemical: H3PO4, H2SO4
Heating Elements: Tungsten Halogen Lamp
Gas Flow Point Valve
A short paragraph describing exactly what this service offers and how it helps clients. This is your chance to convince the visitor that your business is the right choice for them.
since Dec. 24 ‘ 2012