Temp Control
독자적인 고속 다채널 제어기 및
실시간 MIMO 온도 제어기술
Metal Analysis Heating System
Model: Active 1200M Sysytem
Application: Metal Analysis Process (8″ & 12″)
Process Temp: RT ~ 250℃
Temp Control:
Real Time 4 Point MIMO Control
Power Control: 7 Hardware Zone Control
Inline Tab Heating System
Application: Wire Type PV Tabbing Process
Process Temp: RT ~ 250℃
Temp Control: IR Heater & Hot Plate
Vacuum Organic Analysis Heating System
Model: Active 1200V System
Application: Vacuum Organic Analysis Process
Process Temp: RT ~ 400℃
Temp Control:
Real Time 4Point MIMO Control
RTA System
Application: Compound Semiconductor
(LED & LD Mfg.)
Substrate Size: 2″ / 4″ / 6″ / 8″ / 12″
Process Temp: 300 ~ 1200℃
Temp Control:
Real Time 3Point MIMO Control
Wet Etch
Single Heating System
Application: Wet Single Process
Process Temp: RT ~ 230℃
Temp Control:
Real Time 3Point MIMO Control
Power Control: 7Hareware Zone
Chemical In-line Heating System
Application: Chemical Heating
(H3PO4 / H2SO4)
Process Temp: RT ~ 180 ℃
Heating Element: Tungsten Halogen Lamp
IR Heating In-line System
Application: Flexible Display
Substrate Size: Willow Glass 600mm x 0.1T
Process Temp & Control:
RT ~ 200℃ (Option.~400℃) /
3Point MIMO Control
HPO System
3Slot Heating Chamber
Substrate Size: 415 x 510mm Panel
Process Temp & Control: 200℃
Temp Control:
MIMO Control & Slot Selectable
since Dec. 24 ‘ 2012